Lam Research
The Lam 2300 Exelan Flex is an etch chamber for semiconductor wafer processing. The Lam 2300 Exelan Flex is designed for 300 mm (12 inch) wafers.[1][2]

A plasma etch system contains a vacuum chamber that holds the wafer on a support. Process gases are introduced into the chamber through a gas inlet. Radio-frequency power applied to electrodes ionizes the gas into a plasma. The plasma reacts with exposed films on the wafer, removing them to form the desired pattern.
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The Lam 2300 Exelan Flex supports wafers with a 12-inch diameter.[1]
The Lam 2300 Exelan Flex operates on 208 VAC at 50/60 Hz, with a full load current of 56 A and a main circuit breaker rating of 70 A.[3]
The following facts about the 2300 Exelan Flex are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the 2300 Exelan Flex are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the 2300 Exelan Flex are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the 2300 Exelan Flex are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the 2300 Exelan Flex are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the 2300 Exelan Flex is not on record.
Answerable by: an OEM datasheet or a fab qualification report
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Last updated Oct 3, 2026.
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