Lam Research
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The Lam / Novellus / Gasonics L 3300 is an asher. The L 3300 handles 6-inch wafers.[1]
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The L 3300 is an asher used for removing photoresist from semiconductor wafers.[2]
The following facts about the Gasonics L 3300 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Gasonics L 3300 are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the Gasonics L 3300 are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the Gasonics L 3300 are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the Gasonics L 3300 are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the Gasonics L 3300 is not on record.
Answerable by: an OEM datasheet or a fab qualification report
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Last updated Oct 9, 2026.
Headway 1 EC 101 R 485 is a photoresist spinner with stated vacuum and electrical requirements.
The CEE 100 is a spin coater with a listed power specification of 115 volts and 800 watts.
The EV Group 120 Automated Coater Processing System is an automated coater for 6-inch and 8-inch wafers, built in 2015 and requiring 50/60 Hz, 3-phase, 4-wire plus ground power.