Waferpedia

Laurell

400-series

DiscontinuedSpin coater150mmIntroduced Produced 1995–Laurell 400-series family
Research Quality: 60% complete

The Laurell WS-400-6NPP is a manual tabletop spin coater from the 400-series. The WS-400-6NPP can spin substrates up to 150 mm in diameter and 4x4 inch substrates. The WS-400-6NPP uses a 400-series process controller capable of storing and automatically running process recipes consisting of run time and acceleration rate.[1][2]

400-series — web.archive.org
Fig. 01400-seriesweb.archive.org[1]

Wafer size

150mm

Produced

1995–

Power

95 to 240 VAC, 47/63 Hz, ~300 Watts[1]

Vacuum

1.75" (45 mm) diameter vacuum chuck[2]

Preceded by
First in line
This tool
400-series
Succeeded by
WS-650
All related

What it is

The Laurell WS-400-6NPP is a 400-series spin coater, a tabletop spin processor used for depositing thin liquid films onto substrates by centrifugal force. The system is offered as a manual tabletop unit and is capable of processing wafers up to 150 mm in diameter and 4" × 4" substrates.[1][2][3]

How it works

The WS-400-6NPP uses a 400-series process controller that can store and automatically run process recipes consisting of run time and acceleration rate, or it can be operated manually. The controller features a back-lit display and membrane keypad, and it can store up to 20 programs with up to 51 steps per program. Each step includes a time (from 0.1 seconds to 99 minutes 59.9 seconds), a speed, and an acceleration or deceleration rate.[1][2][3][4]

The substrate is held on a vacuum chuck; the standard chuck has a 1.75" (45 mm) diameter and is supplied with a fragment adapter that covers substrates from 10 mm through 150 mm SEMI wafers. A proprietary labyrinth seal protects the motor and control electronics from chemical contamination and provides a nitrogen purge to the process chamber.[1][2][3]

Safety interlocks prevent rotation when the vacuum hold-down force is insufficient (vacuum interlock) and when the lid is open (lid interlock). A process safeguard feature prevents the same process from being inadvertently run again on the same substrate, though it can be bypassed to allow repeated runs or looping sequences.[1][2][3][4]

What can it run?

Process applications and technology nodes documented for this tool.

  • Coating
  • Etching
  • Developing
  • Rinsing-Drying
  • Cleaning

Why won't it start?

Documented failure modes, common issues, and field considerations.

  • Dispense options on this model are limited to manual applicators.
  • The model is not upgradable.

What do the numbers mean?

Power & electrical2

Power
95 to 240 VAC, 47/63 Hz, ~300 Watts[1]
Accurate?
Power requirement
95 to 240VAC, 47/63HZ, ~300 Watts[1]
Accurate?

Vacuum & pumping3

Standard chuck
1.75" (45 mm) diameter vacuum chuck[2]
Accurate?
Vacuum suggestion
25–28 inches Hg vacuum with 4.5 SCFM flow at 0 inches Hg suggested[1]
Accurate?
Vacuum chuck diameter
1.75" (45 mm) diameter vacuum chuck[1]
Accurate?

Wafer handling7

Spin speed
10,000 RPM (based on a 100 mm SEMI Std. wafer)[2]
Accurate?
Maximum wafer size
Up to 150 mm wafers[2]
Accurate?
Substrate size
4" x 4" (102 mm x 102 mm) substrates[2]
Accurate?
Standard adapter coverage
One fragment adapter standard covering 10 mm through 150 mm SEMI wafers[1]
Accurate?
Maximum substrate size
Ø150 mm wafers and 4" × 4" (102 mm × 102 mm) substrates[2]
Accurate?
Maximum speed
10,000 RPM (based on a Ø100 mm SEMI Std. wafer)[2]
Accurate?
Fragment adapter coverage
10 mm through 150 mm SEMI wafers[1]
Accurate?

Gas & chemistry1

Housing material
Solid co-polymer blend exclusive to Laurell Technologies; resists solvents and strong acids and bases[1]
Accurate?

Control & software2

Process controller
400-series process controller capable of storing and automatically running process recipes consisting of run time and acceleration rate, with manual operation also supported[1]
Accurate?
Process controller
400-series process controller capable of storing and automatically running recipes of run time and acceleration rate, also manual operation[1]
Accurate?

Configuration & options1

Housing material
Solid co-polymer blend exclusive to Laurell Technologies[1]
Accurate?

Vintage & configurations

  1. 1995Production start[1]

    The WS-400 series is stated to have had its advent in 1995.

  2. 2011End of life[1]

    Replacement was stated as inevitable in August 2011.

Documented models & variants

DesignationGenerationVintageChangesSource
WS-400-6NPP—1995Described as a manual tabletop system; sources also note a 650-series replacement controller on newer models and that the 650 is not available on 6 series systems.web.archive.org[1]
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What replaced it?

  • successorLaurell WS-650— The WS-650 controller is stated to have replaced the WS-400.source[1]

What does it need to run?

Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.

  • Standard chuck1.75" (45 mm) diameter vacuum chuck[2]
  • Power95 to 240 VAC, 47/63 Hz, ~300 Watts[1]
  • Vacuum suggestion25–28 inches Hg vacuum with 4.5 SCFM flow at 0 inches Hg suggested[1]
  • Vacuum chuck diameter1.75" (45 mm) diameter vacuum chuck[1]
  • Housing materialSolid co-polymer blend exclusive to Laurell Technologies; resists solvents and strong acids and bases[1]
  • Power requirement95 to 240VAC, 47/63HZ, ~300 Watts[1]

Where are the manuals?

Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.

Not publicly documented

Field notes

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Frequently asked questions

What is the maximum substrate size the WS-400-6NPP can handle?

The WS-400-6NPP can spin wafers up to 150 mm in diameter and substrates up to 4" × 4" (102 mm × 102 mm).[2][3]

What rotational speed can the WS-400-6NPP achieve?

The WS-400-6NPP can achieve 10,000 RPM based on a 100 mm SEMI standard wafer.[2][3]

What are the utility requirements for the WS-400-6NPP?

The system requires nitrogen or CDA at 60–70 PSIG for the labyrinth seal purge, consuming 3 cubic feet per hour. Vacuum of 25–28 inHg with a flow of 4.5 SCFM at 0 inHg is suggested. Power input is 95 to 240 VAC, 47/63 Hz, approximately 300 watts.[1][2][3]

Does the WS-400-6NPP allow automated fluid dispensing?

No. Dispense options on this model are limited to manual applicators, and the system is not upgradable to automated dispensing.[1][2][3]

Not publicly documented

The following facts about the 400-series are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

  • The control-system platform and OS era of the 400-series are not on record.

    Answerable by: an engineer who operated it or OEM installation records

  • The process node or technology generation of the 400-series is not on record.

    Answerable by: an OEM datasheet or a fab qualification report

  • No publicly documented compatible parts, consumables, or accessories for the 400-series are on record.

    Answerable by: an OEM parts catalog or a service engineer

  • No publicly hosted manuals, SOPs, or datasheets for the 400-series are on record.

    Answerable by: university cleanroom staff or an OEM application specialist

Sources & citations

Sources (4)Every fact above is drawn from these public sources
  1. [1]web.archive.org — web.archive.orgweb.archive.org
  2. [2]web.archive.org — web.archive.orgweb.archive.org
  3. [3]web.archive.org — web.archive.orgweb.archive.org
  4. [4]400-Series Controller - Laurell Technologies — images.laurell.comimages.laurell.com
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Last updated Sep 26, 2026.

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