Pfeiffer
Alcatel 601 E DRIE
What it is
How it works
Where it fits in the process flow
General reference — not yet source-verifiedA DRIE system is positioned after photolithography in the semiconductor or MEMS fabrication line, where a patterned photoresist or hard mask defines the areas to be etched.
Downstream steps typically include resist stripping, cleaning, and often deposition or further processing of the etched features.
Applications
General reference — not yet source-verifiedThe Alcatel 601 E DRIE is used for etching deep features in silicon for microelectromechanical systems, through-silicon vias, and microfluidic devices.
What do the numbers mean?
Power & electrical4
Vacuum & pumping2
- VAT Adaptive Pressure Controller[1]
Configuration & options7
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Not publicly documented
The following facts about the Alcatel 601 E DRIE are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Alcatel 601 E DRIE are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the Alcatel 601 E DRIE are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the Alcatel 601 E DRIE are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the Alcatel 601 E DRIE are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the Alcatel 601 E DRIE is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (2)Every fact above is drawn from these public sources
- [1]Inventory photo
- [2]waferpedia.com — waferpedia.comwaferpedia.com
Last updated Oct 7, 2026.
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