Plasma-Therm
Dual SLR ICP
Provisional entry — research in progress
This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.
The Plasma-Therm Dual SLR ICP is an inductively coupled plasma etcher.[1]
What it is
The Plasmatherm Dual SLR is an inductively coupled plasma (ICP) etcher used for dry etching in semiconductor manufacturing.[1]
Where it fits in the process flow
General reference — not yet source-verifiedICP etchers are placed in the dry etch module of a semiconductor fab, typically after lithographic patterning. The machine removes material from unmasked areas of a substrate, transferring the photoresist pattern into the underlying film. Etched wafers then proceed to resist strip and cleaning steps before further deposition or lithography cycles.
Applications
General reference — not yet source-verifiedICP etchers are used to etch a wide range of materials including silicon, silicon dioxide, silicon nitride, metals, and compound semiconductors. Common applications include gate stack etching, contact hole formation, damascene trench etching, and through-silicon via (TSV) etching. The high density and low pressure of the ICP plasma enable deep, anisotropic etching with minimal damage.
What do the numbers mean?
No specifications recorded yet
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Where are the manuals?
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Not publicly documented
Field notes
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Frequently asked questions
What is the model designation?
The model is Dual SLR.[1]
Not publicly documented
The following facts about the Dual SLR ICP are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No specifications for the Dual SLR ICP are on record.
Answerable by: an OEM datasheet, a cleanroom equipment inventory, or an engineer who operated or installed it
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Dual SLR ICP are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the Dual SLR ICP are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the Dual SLR ICP are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the Dual SLR ICP are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (1)Every fact above is drawn from these public sources
- [1]Equipment inventory listing
Last updated Sep 29, 2026.
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