Plasma-Therm
Shuttleline ICP
Provisional entry — research in progress
This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.
The Plasma-Therm Shuttleline ICP Etcher is an inductively coupled plasma etcher. The Shuttleline ICP processes 6-inch wafers. The Shuttleline ICP is used for etching III-V materials.[1][2]
What it is
How it works
Where it fits in the process flow
General reference — not yet source-verifiedThe Plasma-Therm Shuttleline ICP sits in the etch module of a semiconductor process flow.
The Shuttleline ICP is used after pattern definition to transfer the pattern into exposed films.
Applications
What do the numbers mean?
Vacuum & pumping3
- External Pumps and chiller not included[1]
Wafer handling1
Configuration & options4
- Etched III-V materials[1]
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
What type of etcher is the Plasma-Therm Shuttleline ICP?
The Plasma-Therm Shuttleline ICP is an inductively coupled plasma etcher.[1][2][3]
What wafer size does the Plasma-Therm Shuttleline ICP process?
The Plasma-Therm Shuttleline ICP processes 6-inch wafers.[1][2][3]
Not publicly documented
The following facts about the Shuttleline ICP are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Shuttleline ICP are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the Shuttleline ICP are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the Shuttleline ICP are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the Shuttleline ICP are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the Shuttleline ICP is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (3)Every fact above is drawn from these public sources
- [1]Inventory photo
- [2]waferpedia.com — waferpedia.comwaferpedia.com
- [3]Plasma-Therm Shuttleline ICP family | Waferpedia — waferpedia.comwaferpedia.com
Last updated Oct 8, 2026.
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