Semitool
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The Semitool Scepter SCE A 311 (also designated SCE-A-311) is a wet etcher (acid spray) for 200 mm wafers, manufactured in 2001. The Semitool Scepter SCE-A-311 uses software revision SAAB 3.1.[1][2]

In a spray etcher, the wafer is held on a spinning chuck while a chemical etchant is sprayed onto the front surface through one or more nozzles. The rotation of the wafer ensures uniform distribution of the chemical and helps to maintain consistent etch rates across the wafer. The tool typically includes chemical delivery systems, exhaust handling for fumes, and a rinse/dry cycle to remove residual chemicals after etching.
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The following facts about the Scepter SCE A 311 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Scepter SCE A 311 are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the Scepter SCE A 311 are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the Scepter SCE A 311 are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the Scepter SCE A 311 are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the Scepter SCE A 311 is not on record.
Answerable by: an OEM datasheet or a fab qualification report
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Last updated Oct 7, 2026.
The Applied Materials 0010-47763 is an electrostatic chuck (ESC) assembly used in semiconductor etching processes.
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Oxford Instruments 100 ICP Fluorine is an inductively coupled plasma etcher for fluorine-based etching, supporting cryo DRIE and multiple etch gases including SF6 and C4F8.