Waferpedia

Strasbaugh

7 AF Wafer

7 AF Wafer — Inventory photo
Fig. 017 AF WaferInventory photo[1]

Wafer size

Wafer handler

Power

208 V, 3 phase, 60 Hz[1]

Vacuum

Vacuum[1]

What it is

The Strasbaugh 7 AF is a wafer grinder used in semiconductor manufacturing.[1][2][3]

How it works

The system uses linear traversing grind spindles and force adaptive grinding to control material removal.[2][3]

In-situ thickness control provides real-time monitoring of wafer thickness during the grinding process.[2][3]

The grinder supports automated process control and thin wafer handling for processing wafers that have been thinned.[2][3]

Where it fits in the process flow

General reference — not yet source-verified

Wafer grinding is performed after the front-end-of-line (FEOL) and back-end-of-line (BEOL) processing steps are complete, and before wafer dicing.

The process reduces the wafer thickness to enable stacking in multi-chip packages and to improve heat dissipation.

Applications

General reference — not yet source-verified

The machine is applicable in the production of memory, logic, and other integrated circuits that require wafer thinning.

What do the numbers mean?

Power & electrical10

Power
208 V, 3 phase, 60 Hz[1]
Accurate?
No power supply[1]
Accurate?
Frequency
60 Hz[2]
Accurate?
Phase
3 Phase[2]
Accurate?
Voltage
230 V[2]
Accurate?
Full Load Amp
45 A[2]
Accurate?
Voltage
208 V[3]
Accurate?
Power
230 V, 3 phase, 60 Hz[2]
Accurate?
Full load amp
20 A[3]
Accurate?
No power supply
Listed[1]
Accurate?

Vacuum & pumping3

Vacuum[1]
Accurate?
Vacuum
Listed[1]
Accurate?
No backing pumps
Listed[1]
Accurate?

Wafer handling12

Can produce wafers as-is[1]
Accurate?
Wafer size
Wafer handler[1]
Accurate?
2 Cassette / FOUP loaders[1]
Accurate?
Robot Type
Genmark[1]
Accurate?
Wafer size
Wafer Cassette[4]
Accurate?
Wafer size
Wafer aligner[4]
Accurate?
Equipment type
Wafer grinder[1]
Accurate?
Wafer size
6 inch[1]
Accurate?
Thin wafer handling
Listed[2]
Accurate?
Wafer handler
Listed[1]
Accurate?
Cassette / FOUP loaders
2[1]
Accurate?
Wafer size
Thin wafer handling[2]
Accurate?

Control & software2

In-situ thickness control
Listed[2]
Accurate?
Automated process control
Listed[2]
Accurate?

Dimensions & facilities2

CDA[1]
Accurate?
CDA
Listed[1]
Accurate?

Configuration & options27

Date of Audit
9/12/25[1]
Accurate?
Manuals included[1]
Accurate?
All cables present[1]
Accurate?
Pre-Aligner[1]
Accurate?
Mini Environment[1]
Accurate?
SystemSW (App) Version
7.25.0[1]
Accurate?
GEM / SECS[1]
Accurate?
Ethernet[1]
Accurate?
Heat Exchange / Chiller[1]
Accurate?
DIW[1]
Accurate?
No field modifications[1]
Accurate?
No Ext Transformer[1]
Accurate?
Tapeless backgrinding
Listed[2]
Accurate?
In-feed technology
Listed[2]
Accurate?
Force adaptive grinding
Listed[2]
Accurate?
Linear traversing grind spindles
Listed[2]
Accurate?
Pre-aligner
Listed[1]
Accurate?
Mini environment
Listed[1]
Accurate?
SystemSW version
7.25.0[1]
Accurate?
GEM / SECS
Listed[1]
Accurate?
Ethernet
Listed[1]
Accurate?
Heat exchange / chiller
Listed[1]
Accurate?
DIW
Listed[1]
Accurate?
No field modifications
Listed[1]
Accurate?
No external transformer
Listed[1]
Accurate?
No UPS
Listed[1]
Accurate?
No corrosion visible on modules
Listed[1]
Accurate?
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What does it need to run?

Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.

  • ConfigurationVacuum[1]
  • Power208 V, 3 phase, 60 Hz[1]
  • ConfigurationNo power supply[1]
  • Frequency60 Hz[2]
  • Phase3 Phase[2]
  • Voltage230 V[2]
  • Full Load Amp45 A[2]
  • Voltage208 V[3]
  • VacuumListed[1]
  • Power230 V, 3 phase, 60 Hz[2]
  • Full load amp20 A[3]
  • No power supplyListed[1]
  • No backing pumpsListed[1]

Where are the manuals?

Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.

Not publicly documented

Field notes

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Frequently asked questions

Why is wafer grinding performed before dicing in many flows?General reference — not yet source-verified

Grinding is used to thin the wafer and improve its suitability for later singulation and assembly steps.

What is the main process concern for this equipment class?General reference — not yet source-verified

The main concern is controlled material removal with accurate alignment so the wafer is processed without introducing unacceptable damage.

Not publicly documented

The following facts about the 7 AF Wafer are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

  • No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the 7 AF Wafer are on record.

    Answerable by: OEM historical records or a trade-press announcement

  • No publicly documented variants, configuration options, or revision breakpoints of the 7 AF Wafer are on record.

    Answerable by: an OEM product catalog or an engineer who ordered or specified the tool

  • The control-system platform and OS era of the 7 AF Wafer are not on record.

    Answerable by: an engineer who operated it or OEM installation records

  • No publicly documented failure modes or field errata for the 7 AF Wafer are on record.

    Answerable by: a field service engineer, process engineer, or maintenance technician

  • The process node or technology generation of the 7 AF Wafer is not on record.

    Answerable by: an OEM datasheet or a fab qualification report

No research found yet — worked with this tool? Share what you know.

Sources & citations

Sources (4)Every fact above is drawn from these public sources
  1. [1]Inventory photo
  2. [2]Inventory photo
  3. [3]Inventory photo
  4. [4]Inventory photo
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Last updated Sep 30, 2026.

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