SUSS MicroTec
RC 8 Spin
Provisional entry — research in progress
This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.
The SUSS RC 8 is a spin coater.[1]
What it is
General reference — not yet source-verifiedSpin coaters are a class of semiconductor and microelectronics processing equipment used to deposit uniform liquid films onto flat substrates. The substrate is held on a spinning chuck that accelerates to a controlled rotational speed, spreading the fluid by centrifugal force. Spin coaters are essential for photoresist application in photolithography and for other coating steps in wafer fabrication.
Where it fits in the process flow
General reference — not yet source-verifiedUpstream processes prepare the wafer surface for coating, while downstream steps include edge-bead removal, post-apply bake, and alignment/exposure. The spin coater thus sits at the beginning of the resist coating loop.
What do the numbers mean?
No specifications recorded yet
Be the first to add cited specifications for this tool.
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
What is the model of this equipment?
The model is RC 8.[1]
Not publicly documented
The following facts about the RC 8 Spin are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No specifications for the RC 8 Spin are on record.
Answerable by: an OEM datasheet, a cleanroom equipment inventory, or an engineer who operated or installed it
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the RC 8 Spin are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the RC 8 Spin are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the RC 8 Spin are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the RC 8 Spin are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (1)Every fact above is drawn from these public sources
- [1]Equipment inventory listing
Last updated Sep 28, 2026.
Compare with similar tools
View all →
Headway 1 EC 101 R 485 is a photoresist spinner with stated vacuum and electrical requirements.
The CEE 100 is a spin coater with a listed power specification of 115 volts and 800 watts.
The EV Group 120 Automated Coater Processing System is an automated coater for 6-inch and 8-inch wafers, built in 2015 and requiring 50/60 Hz, 3-phase, 4-wire plus ground power.
