Tegal
Plasmaline 411
What it is
General reference — not yet source-verifiedA plasma asher or plasma etcher is a semiconductor process machine that uses a plasma environment to remove material from a wafer surface or to strip organic films. The Tegal Plasmaline 411 belongs to that class of vacuum-based process equipment.
How it works
General reference — not yet source-verifiedA plasma processing tool ionizes process gas inside a chamber and uses the reactive species to modify or remove material at the wafer surface. A resist-processing configuration uses that mechanism to strip photoresist and related organic residues after lithography or etch steps.
Where it fits in the process flow
General reference — not yet source-verifiedResist processing sits in the fabrication flow after lithographic pattern transfer or other steps that leave organic residues on the wafer. The process removes resist or residue before the wafer moves to the next clean, inspection, or patterning operation.
Applications
General reference — not yet source-verifiedPlasma ashers and etchers are commonly used in semiconductor manufacturing for photoresist removal, residue cleaning, and dry process steps on wafer surfaces. The same class of equipment is also used where a dry, chemical-reaction-based alternative is needed instead of liquid cleaning.
- Resist processing
What do the numbers mean?
Configuration & options4
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
What type of equipment is the Tegal Plasmaline 411?
The Tegal Plasmaline 411 is a plasma asher and plasma etcher associated with resist processing.[1]
Not publicly documented
The following facts about the Plasmaline 411 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Plasmaline 411 are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the Plasmaline 411 are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the Plasmaline 411 are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the Plasmaline 411 are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the Plasmaline 411 is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (1)Every fact above is drawn from these public sources
- [1]semistarcorp.com — semistarcorp.comsemistarcorp.com
Last updated Oct 3, 2026.
Compare with similar tools
View all →
Headway 1 EC 101 R 485 is a photoresist spinner with stated vacuum and electrical requirements.
The CEE 100 is a spin coater with a listed power specification of 115 volts and 800 watts.
The EV Group 120 Automated Coater Processing System is an automated coater for 6-inch and 8-inch wafers, built in 2015 and requiring 50/60 Hz, 3-phase, 4-wire plus ground power.
