Tokyo Electron
Clean Track Lithius
Provisional entry — research in progress
This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.
The Clean Track Lithius is a coater/developer system. The Clean Track Lithius processes 200 mm (8 inch) wafers.[1][2][3]
What it is
How it works
General reference — not yet source-verifiedCoater/developers operate by spin coating: the wafer is spun at high speed while a liquid is dispensed onto its center, spreading evenly by centrifugal force. After coating, the wafer undergoes baking on hotplates to evaporate solvents and cure the film. Some systems incorporate low-oxygen environments to prevent oxidation during curing.
Where it fits in the process flow
General reference — not yet source-verifiedIn the fabrication sequence, a coater/developer is used after wafer cleaning and before photolithographic exposure to apply the photosensitive resist layer. After exposure, the machine develops the pattern through baking or chemical treatment. The equipment can also handle other liquid films such as spin-on dielectrics or sacrificial layers.
Applications
General reference — not yet source-verifiedThe Clean Track Lithius is suitable for applying and developing photoresists for photolithography, as well as for spin-on dielectric materials used in inter-metal dielectric layers, shallow trench isolation, and other insulating films.
What do the numbers mean?
Power & electrical2
Wafer handling1
Gas & chemistry1
Configuration & options1
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
Not publicly documented
The following facts about the Clean Track Lithius are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Clean Track Lithius are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the Clean Track Lithius are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the Clean Track Lithius are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the Clean Track Lithius are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the Clean Track Lithius is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (4)Every fact above is drawn from these public sources
- [1]Inventory photo
- [2]Equipment inventory listing
- [3]Inventory photo
- [4]CLEAN TRACK ACT 12 SOD / 8 SOD | Tokyo Electron — tel.com (Oct 18, 2009)web.archive.org
Last updated Sep 30, 2026.
Compare with similar tools
View all →The Glen/YES 1000FP is a plasma cleaning system designed to accept a range of shelf sizes for changing flat panel industry needs.
The 1000P is a plasma cleaning system with four 16 x 16 inch shelves and a total capacity of 1024 square inches.
The Semitool 11600 SRD is a spin rinse dryer manufactured by Semitool.