Tokyo Electron
TE 8500 PESC Dry
The Tokyo Electron TE 8500 PESC Dry is a dry etcher with one chamber. The TE 8500 PESC Dry performs oxide etch with endpoint capability. The TE 8500 PESC Dry uses process gases CF4, CHF3, and He.[1][2]
What it is
How it works
Where it fits in the process flow
General reference — not yet source-verifiedThe Tokyo Electron TE 8500 PESC Dry sits in the pattern transfer portion of wafer processing, after a film has been deposited and patterned by lithography.
The Tokyo Electron TE 8500 PESC Dry removes oxide selectively as part of dry etch processing before later fabrication steps continue.
Applications
What do the numbers mean?
Vacuum & pumping2
- OS: EPROM based system - LD: 2ea, Fortrend - Pump: 2ea, Ebara, A30W[1]
Wafer handling1
Gas & chemistry2
Control & software1
Configuration & options6
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Not publicly documented
The following facts about the TE 8500 PESC Dry are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the TE 8500 PESC Dry are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the TE 8500 PESC Dry are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the TE 8500 PESC Dry are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the TE 8500 PESC Dry are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the TE 8500 PESC Dry is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (2)Every fact above is drawn from these public sources
- [1]inventory listing
- [2]waferpedia.com — waferpedia.comwaferpedia.com
Last updated Oct 7, 2026.
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