Waferpedia

Ulvac

NE 550 EX Dry

EtchUlvac NE 550 EX Dry family
Research Quality: 30% complete

Provisional entry — research in progress

This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.

The Ulvac NE 550 EX is a dry etcher that handles 4 inch wafers.[1]

UlvacNE 550 EX Dry
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What it is

General reference — not yet source-verified

Dry etching systems remove material from semiconductor wafer surfaces using chemically reactive gases in a plasma state. The process is anisotropic and capable of high-fidelity pattern transfer.

How it works

General reference — not yet source-verified

In dry etching, a vacuum chamber is filled with a process gas that is ionized into a plasma by an electromagnetic field. Energetic ions are directed toward the wafer surface, where they react with or physically sputter the material to be removed.

Where it fits in the process flow

General reference — not yet source-verified

Dry etching typically follows photolithography in the semiconductor fabrication sequence. The patterned photoresist mask defines areas to be etched, and the etching step transfers the pattern into the underlying layer.

Applications

General reference — not yet source-verified

Dry etching is used for patterning dielectrics, silicon, and metals in semiconductor device fabrication. Common applications include trench etching, contact hole formation, and gate definition.

What do the numbers mean?

Wafer handling1

Wafer Size
4 inch[1]
Accurate?

Configuration & options1

Type
Dry Etcher[1]
Accurate?
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Where are the manuals?

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Not publicly documented

Field notes

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Frequently asked questions

What type of equipment is the Ulvac NE 550 EX?

The Ulvac NE 550 EX is a dry etching system.[1]

Not publicly documented

The following facts about the NE 550 EX Dry are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

  • Fewer than 3 independently cited specifications for the NE 550 EX Dry are on record; the remainder await public documentation.

    Answerable by: an OEM datasheet, a cleanroom equipment inventory, or an engineer who operated or installed it

  • No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the NE 550 EX Dry are on record.

    Answerable by: OEM historical records or a trade-press announcement

  • No publicly documented variants, configuration options, or revision breakpoints of the NE 550 EX Dry are on record.

    Answerable by: an OEM product catalog or an engineer who ordered or specified the tool

  • The control-system platform and OS era of the NE 550 EX Dry are not on record.

    Answerable by: an engineer who operated it or OEM installation records

  • No publicly documented failure modes or field errata for the NE 550 EX Dry are on record.

    Answerable by: a field service engineer, process engineer, or maintenance technician

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Sources & citations

Sources (1)Every fact above is drawn from these public sources
  1. [1]Equipment inventory listing
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Last updated Sep 27, 2026.

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