SCREEN
FC 821
Provisional entry — research in progress
This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.
What it is
General reference — not yet source-verifiedA wafer scrubber is a cleaning tool used in semiconductor manufacturing to remove surface particles and process residue from wafers after earlier fabrication steps. Wet-processing cleaners sit in the line where wafer surfaces need particle reduction and chemical cleaning before later process steps or inspection.
How it works
General reference — not yet source-verifiedA wafer scrubber typically uses liquid chemistry, mechanical contact, or a combination of both to dislodge contamination from the wafer surface. The cleaning sequence commonly includes one or more wash stages followed by rinsing and drying to leave the wafer ready for the next operation.
Where it fits in the process flow
General reference — not yet source-verifiedThe FC 821 belongs in the wafer-cleaning portion of the fabrication flow. A scrubber such as this is used after process steps that leave particles, films, or residues on the wafer and before later processing that benefits from a cleaner surface.
Applications
General reference — not yet source-verifiedWafer scrubbers are used for particle removal and surface cleaning in semiconductor manufacturing. The equipment class supports preparation of wafers for later deposition, lithography, inspection, or other downstream processing steps that require cleaner surfaces.
What do the numbers mean?
Wafer handling1
Configuration & options4
- Frame, 5 ch, 2 baths[1]
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
What is the SCREEN FC 821?
The SCREEN FC 821 is a wafer scrubber used in wet-processing and cleaning.[1]
Not publicly documented
The following facts about the FC 821 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the FC 821 are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the FC 821 are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the FC 821 are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the FC 821 are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the FC 821 is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (1)Every fact above is drawn from these public sources
- [1]inventory listing
Last updated Oct 8, 2026.
Compare with similar tools
View all →The Glen/YES 1000FP is a plasma cleaning system designed to accept a range of shelf sizes for changing flat panel industry needs.
The 1000P is a plasma cleaning system with four 16 x 16 inch shelves and a total capacity of 1024 square inches.
